




| Equipment | Model No. | Capability | Example of Analysis and Measurement | |||||||||||||
| XRFS: Wavelength dispersive X-ray fluorescence spectrometer [PIC] |
RIX-3000 | Elemental analysis (B to U); Component determination using fundamental parameter Method |
Quantitative analysis (ceramics, thin film , plastics, metals); Qualitative analysis |
|||||||||||||
| XRD: X-ray diffracto- meter [PIC] |
RAD-C | Powder X-ray diffractometry; Thin film X-ray diffractometry |
Qualitative analysis; Analysis of state (crystallinity, amorphous state, crystal lattice) |
|||||||||||||
| EPMA: Electron probe micro analyzer [PIC] |
EPMA-8750QH | Microprobe analysis (1 to 3 Elemental analysis (B to U); Image mapping |
Local analysis; Grain boundary analysis; Segregation analysis of crystalline; Analysis of corrosion products, particulate contaminations and etc. |
|||||||||||||
| SEM-EDX: Scanning electron microscope applied Energy dispersive X-ray fluorescence spectrometer [PIC] |
DX4-Superscan 330 | Max. sample size 200mm Magnifying power (X15 to X20,000); Elemental analysis (B to U; 0.1% order); Image mapping |
Fractography test; Local analysis; Surface examination; Analysis of corrosion products, particulate contaminations and etc. |
|||||||||||||
| ICP-AES: Inductively coupled plasma optical emission spectrometer |
ICPS-8100 | Sequential scanning type; Measurement wavelength 160 to 750nm |
Elemental analysis in sample solution (mg /L) |
|||||||||||||
| AAS: Atomic Absorption Spectrometer | A-1800 & GA-3 | Measurement wavelength 190 to 900nm; Air-acetylene flame atomic absorption spectrometry; Flameless atomic absorption spectrometry |
Elemental analysis in sample solution ( mg/L); Quantitative analysis of alkali metals |
|||||||||||||
| FT-IR: Fourier transform infrared spectro- photometer applied infrared microscope [PIC] |
Nexus 470, | Accessories: Variable angle specular reflectance, Single bounce attenuated total reflectance and Diffuse reflectance |
Analysis of organic compounds (rubber, plastics, oil, grease, adhesive, surface active agent, etc.); Microprobeanalysis of contamination |
|||||||||||||
| Contin |
||||||||||||||||
| TA: Thermoana- lyzer |
DSC 8230 | DSC(Differential scanning calorimeter; -50 |
Calorimetry of crystalli- zation, decomposition, formation, reaction, solidification and etc. |
|||||||||||||
| TG-DTA 8120 | TG-DTA(Thermogravime- ter Differential thermal analyzer; room temp. to 1500 |
Analysis of glass transition point, softening point, melting point, etc. |
||||||||||||||
| TMA 8310 | TMA (Thermomechanical analyzer; room temp to 1500 |
Thermodilatometry of ceramics, plastics and metals |
||||||||||||||
| HPLC: High performance liquid chromato- graph |
655-12 | Detector: UV-detector, Differential refractometer and Electric conductivity detector |
Anion-chromatography (mg /L); Gel permeation chromatography | |||||||||||||
| GC: Gas chromato- graph |
G-3000 | Detector: TCD and FID. Column: glass, metal and G-column. Accessory: Curie point pyrolyser (JHP-2) |
Purity test of solvent; Pyrolysis gas chromato- graphy of polymer |
|||||||||||||
| SPM: Scanning probe microscope [PIC] |
Nano Scope |
AFM: Atomic force microscopy. MFM: Magnetic force microscopy |
Surface roughness (nm order); Examination of magnetic bit pattern |
|||||||||||||
| Ultraviolet and visible spectro- photometer [PIC] |
U-4000 | Scanning wavelength 240 to 2600nm; Accessories: 60 |
Molecular absorption spectrophotometry; Turbidimetry; Measure- ment of transmittance and reflectance; Color analysis |
|||||||||||||
| Ellipsometer [PIC] |
VASE Series | Scanning wavelength 250 to 1700nm; Incident-angle power 0.005 |
Determine thin film layer thickness and refractive index |
|||||||||||||
| Others: Electric conductivity meter, pH meter, Oxidation-Reduction potential meter, Abbe refractometer, etc. | ||||||||||||||||







